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Samsung High NA EUV DRAM Set for 2028, With 12-Inch Photomasks and a Mistral AI Series D Lead
Samsung High NA EUV DRAM Set for 2028, With 12-Inch Photomasks and a Mistral AI Series D Lead
Samsung Electronics made two moves in two days that both point at the same problem: keeping its memory and foundry lines on the leading edge as AI demand outruns conventional scaling. On September 8, Samsung and ASML announced an expanded partnership under which Samsung will put ASML’s High NA extreme ultraviolet (EUV) lithography into high-volume
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